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dc.contributor.authorAndreatta, Gaëlle Anne Léonie
dc.contributor.authorLachowicz, Agata
dc.contributor.authorBlondiaux, Nicolas
dc.contributor.authorAllebé, Christophe
dc.contributor.authorFaes, Antonin
dc.identifier.citationThin Solid Films, Vol 691, pp. 137624en_US
dc.description.abstractWe present a novel, simple and cost-effective method for patterning transparent conductive oxides (TCO) in order to form solar cell's metal grid by electro-plating. Self-assembled monolayers (SAMs) are prepared by dipping substrates in or spraying TCO with perfluorinated and alkylated phosphonic acid solutions. The investigated chemistry and explored deposition parameters on indium tin oxide have resulted in highly hydrophobic surfaces with exceptional coverage of the TCO by the SAMs. The resistance of the deposited layers to acidic plating conditions has been challenging but SAMs at optimized processing conditions have demonstrated masking properties for nickel electroplating.en_US
dc.description.sponsorshipANR SNSFen_US
dc.subjectSelf-assembled monolayers Phosphonic acid Transparent conductive oxide Indium tin oxide Electroplating Silicon heterojunction solar cellsen_US
dc.titlePatterning solar cell metal grids on transparent conductive oxides using self-assembled phosphonic acid monolayersen_US
dc.type.csemresearchareasFunctional Surfacesen_US
dc.type.csemresearchareasEnergy Harvestingen_US
dc.type.csemresearchareasPV & Solar Buildingsen_US

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