• Login
    View Item 
    •   YODA Home
    • CSEM Archive
    • Research Publications
    • View Item
    •   YODA Home
    • CSEM Archive
    • Research Publications
    • View Item
    JavaScript is disabled for your browser. Some features of this site may not work without it.

    Highly Mismatched, Dislocation-Free SiGe/Si Heterostructures

    Thumbnail
    Author
    Isa, F.; Salvalaglio, M.; Dasilva, Y. A. R.; Meduna, M.; Barget, M.; Jung, A.; et al.
    Metadata
    Show full item record
    Abstract
    An experiment has demonstrated that truly dislocation free SiGe crystals with widths of at least 5?m can be epitaxially grown on Si substrates by applying the compositional grading developed for layers to 3D structures. At such crystal widths, the epitaxial growth of SiGe alloys with a constant high Ge content inevitably leads to the injection of dislocations. The reason is that at dimension far above the nanoscale the low aspect ratio of the SiGe/Si system during the initial stages of the growth does not allow for sufficient elastic strain relaxation. The findings suggest that there is no limit to the final Ge content, and that the grading rate can be suitably tailored in order to give access to even larger dislocation-free structures. Indeed, preliminary experimental results indicate similar absence of dislocations in SiGe crystals graded to a fi nal Ge content of 80%. Combining this method with layer transfer techniques makes it possible to form dislocation-free SiGe patches many micrometers in size acting as virtual substrates with lattice parameters intermediate to those of Si and Ge on an Si substrate.
    Publication Reference
    Advanced Materials, vol. 28 (5), pp. 884-888, Feb 2016.
    Year
    2016
    URI
    https://yoda.csem.ch/handle/20.500.12839/77
    Collections
    • Research Publications

    Browse

    All of YODACommunities & CollectionsBy Issue DateAuthorsTitlesResearch AreasBusiness UnitsThis CollectionBy Issue DateAuthorsTitlesResearch AreasBusiness Units

    My Account

    Login

    DSpace software copyright © 2002-2022  DuraSpace
    Contact Us | Send Feedback
    DSpace Express is a service operated by 
    Atmire NV