Silicon Carbide Pressure Sensors for Harsh Environments
dc.contributor.author | Hoogerwerf, A. C. | |
dc.contributor.author | Durante, G. S. | |
dc.contributor.author | James, R. J. | |
dc.contributor.author | Dubois, M. | |
dc.contributor.author | Dubochet, O. | |
dc.contributor.author | Despont, M. | |
dc.date.accessioned | 2021-12-09T14:07:02Z | |
dc.date.available | 2021-12-09T14:07:02Z | |
dc.date.issued | 2019 | |
dc.description.abstract | The paper describes the fabrication of a silicon carbide piezoresistive pressure sensors intended for operating temperatures of up to 600°C. The different fabrication aspects, such as the metallization scheme, the etching of a 300μm deep cavity, and the bonding to a silicon carbide back plate are discussed in detail. | |
dc.identifier.citation | 2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems and Eurosensors XXXIII (TRANSDUCERS and EUROSENSORS XXXIII), pp. 2154-2157 | |
dc.identifier.doi | https://doi.org/10.1109/TRANSDUCERS.2019.8808340 | |
dc.identifier.uri | https://hdl.handle.net/20.500.12839/383 | |
dc.subject | Silicon Carbide;SiC;Pressure sensor;high temperature;harsh environment;DRIE;Deep Reactive Ion Etching;SiC contact;metallization | |
dc.title | Silicon Carbide Pressure Sensors for Harsh Environments | |
dc.type | Proceedings Article | |
dc.type.csemdivisions | BU-T | |
dc.type.csemresearchareas | Other |